On the fab floor, one thermal excursion is all it takes to scrap a whole lot. If wafer drying or photoresist bake drifts even a little, you’ll start seeing defects, line-width excursions, and yield loss that don’t show up until hours later. We keep a large inventory of fab IR lamps on hand so your critical thermal steps never have to wait. What matters, technically Our IR lamp line runs the full set—short-wave, medium-wave, and carbon-emitter profiles—so you can match the thermal budget in wafer cleaning and lithography. Fast ramp-up supports soft bake and hard bake with tight uniformity across the wafer, and repeatability keeps the process window from wandering. The emitters are built for cleanroom use, with low outgassing and particle control that holds up in Class 1–100 environments. Output stays stable over long duty cycles, and the hardware drops into the standard fixtures and interfaces you already run on track tools. Why it holds up in practice In wafer drying, the heat comes on fast and stays controlled, pulling moisture off without driving surface stress. In photoresist processing, consistent temperature cuts down standing waves and scum, which helps critical dimension control and cleans up the sidewall profile. You end up with more predictable cycle times, fewer scrap lots, and less energy spent chasing drift. And with inventory ready to go, swaps are quick—so unplanned downtime drops and the schedule stays protected. The things you learn the hard way IR systems demand attention to optical alignment and reflector condition. Even a small mis-focus will shift uniformity. Before installation, confirm tool compatibility and cooling requirements. Lamp output drifts as it ages, so plan preventive replacement and keep a spare set on the shelf. Matching spectral response to the absorbance of the resist stack is non-negotiable—run a short qualification bake to lock in the setpoint.